Pattern Transfer: Photolithography Practice

This 3-page lab guide, created by the Nanotechnology Applications and Career Knowledge Support (NACK) Center at Pennsylvania State University, is for a photolithography lab activity. During the lab, students will use 3'' silicon substrates to "evaluate three different exposure times using hard (standard) contact" to then "decide which exposure time yields the best feature resolution from the results of the experiment." The lab guide includes a description of the lab, background information, pre-requisites for completing the lab, lab instructions, and 11 student questions.