Screenshot

This 3-page document, created by the Nanotechnology Applications and Career Knowledge Network(NACK) Center at Pennsylvania State University, is a guide for a laboratory activity where students learn about low pressure chemical vapor deposition (LPCVD) and plasma enhanced chemical vapor deposition (PECVD) processes as well as how to operate the two systems. The lab is intended to be completed in three parts over two class sessions. The guide includes objectives, an introduction to both LPCVD and PECVD processes, an overview of the activities for both class sessions, and post-lab questions to test student comprehension.

About this Resource

Alternate Title
E SC 212 - Introduction to Low Pressure Chemical Vapor Deposition and Plasma Enhanced Chemical Vapor Deposition
Date Issued
June 24th, 2010
Audience
Language
Archived with ATE Central

Associated Files

Archived

Rights

Rights
The Pennsylvania State University
Add Comment

Comments

(no comments available yet)