Introduction to Plasma-based Processing

This 3-page lab, from the Nanotechnology Applications and Career Knowledge Resource Center (NACK Center), is intended to introduce students to plasma processing for deposition and etching while improving their note-taking skills. To complete the activity, students will undergo training on both the Denton Vacuum Desk IV Sputtering Tool and the Technics Micro-RIE, and consider such topics as sputtering and reactive ion etching. After this exercise students will answer questions like:

• What is the typical base pressure of the sputtering tool?
• What is the typical operating pressure of the sputtering tool?
• What is the typical gas source for sputtering and why is it used?
• What type of power supply does the Denton Desk IV have?
• What type of power supply is on the Technics Micro-RIE 80?
• What is the difference between PE and RIE,
• And more.